Wet Bench Miscellaneous wbmiscres |
Wet Bench Miscellaneous Photoresist Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!
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Matrix Plasma Resist Strip matrix |
Matrix Plasma Resist Strip Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating.
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Karl Suss MA-6 Contact Aligner karlsuss2 |
Contact Aligner Karl Suss MA-6 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
1:1 Contact Aligner.
Backside align.
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Nanospec 3 nanospec3 |
Nanospec 3 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
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Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Tystar Atmospheric Tube Training |
Clean |
SNF Paul G Allen L107 Cleanroom |
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MVD mvd |
MVD Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
Reactor located inside glovebox
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Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip |
Clean (Ge), Semiclean, Flexible |
SNF Paul G Allen L107 Cleanroom |
Wet Resist Removal: SRS-100 or PRS1000
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Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
Isotropic Si etching; can be used for backside Si removal on small pieces
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Karl Suss MA-6 Contact Aligner karlsuss |
Contact Aligner Karl Suss MA-6 Training |
"All" |
SNF Paul G Allen L107 Cleanroom |
1:1 Contact Aligner.
Backside align, including IR.
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Tystar Bank 1 Tube 1 Anneal B1T1 Flexible Oxide |
Tystar Atmospheric Tube Training |
Flexible |
SNF Paul G Allen L107 Cleanroom |
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Sinton Lifetime Tester sinton-lifetime-tester |
Sinton Lifetime Tester Training |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
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LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
LEI1500 Contactless Sheet Resistance Mapping Training |
"All" |
SNF Exfab Paul G Allen 151 Ocean |
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micromanipulator6000 IV-CV probe station micromanipulator6000 |
micromanipulator6000 IV-CV probe station Training |
"All" |
SNF Exfab Paul G Allen 151 Ocean |
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DISCO Wafer Saw DISCO wafersaw |
Wafersaw DISCO training |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
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Plasmaetch PE-50 plasma-etch |
Plasmaetch PE-50 Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
Low power, high pressure plasma; low bias, minimal damage. Often used for surface treatment.
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Lesker Sputter lesker-sputter |
Sputter Lesker 1&2 Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
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AJA Evaporator aja-evap |
Evaporator AJA training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
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First Nano carbon nanotube CVD furnace cvd-nanotube |
cvd-nanotube training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density
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Aixtron Black Magic graphene CVD furnace aixtron-graphene |
CVD graphene furnace Aixtron Black Magic training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
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Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training |
Clean (MOCVD) |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For Sapphire clean: SC1, SC2.
For GaN template on Si or Sapphire: Piranha, SC1, SC2.
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