Short Name:
4"
The following is a list of equipment where 4 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Exposure Wavelength | Mask Size | Resist | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
HMDS Vapor Prime Oven, YES yes |
"All" |
150 ºC
|
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Heidelberg MLA 150 - 2 heidelberg2 |
"All" |
|
375 nm | 1 | ||||||||||||||
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Heidelberg MLA 150 heidelberg |
"All" |
|
405 nm | 1 | ||||||||||||||
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Headway Manual Resist Spinner headway2 |
"All" | one piece or wafer | ||||||||||||||||
|
Headway 3 Manual Resist Spinner headway3 |
"All" | 1 piece or wafer | ||||||||||||||||
|
Gasonics Aura Asher gasonics |
Clean, Semiclean | 25 | ||||||||||||||||
|
Flexus 2320 Stress Tester stresstest |
"All" | 1 | ||||||||||||||||
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First Nano carbon nanotube CVD furnace cvd-nanotube |
Flexible |
800 °C - 1100 °C
|
1x4" wafer or multiple pieces | |||||||||||||||
|
Finetech Lambda flipchipbonder |
Flexible |
°C - 400 °C
|
1 | |||||||||||||||
|
Fiji 3 ALD fiji3 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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|
Fiji 2 ALD fiji2 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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|
Fiji 1 ALD fiji1 |
Semiclean |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | |||||||||||||||||
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Ex Fab Develop Wet Bench wbexfab_dev |
Flexible | |||||||||||||||||
|
EVG 101 Spray Coater evgspraycoat |
"All" | 1 | ||||||||||||||||
|
DISCO Wafer Saw DISCO wafersaw |
Flexible | 1x4", 1x6" or 1x8" wafer, or pieces | ||||||||||||||||
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Critical Point Dryer Tousimis Automegasamdri-936 cpd |
Flexible | |||||||||||||||||
|
CHA Solutions II Evaporator cha-evap |
Flexible |
0.00 -
300.00 nm
|
4"x15 or 6"x3 wafers or pieces | |||||||||||||||
|
ASML PAS 5500/60 i-line Stepper asml |
"All" |
|
365 nm | 5 inch | ||||||||||||||
|
AMAT Centurion Epitaxial System epi2 |
Pre-Diffusion Clean | Clean |
50.00 Å -
3.00 μm
|
600 °C - 1200 °C
|
1 |