The following is a list of equipment where 2 inch round substrates are allowed.
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
Direct Write
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
For LOL2000 bake or bakes which are not allowed in the other ovens and need higher temperatures, up to 200C, programmable.
non contact 3D optical profiling