Short Name:
2"
The following is a list of equipment where 2 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Material Thickness Range | Materials Lab Supplied | Minimum Resolution | Exposure Wavelength | Resist | Developer | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
Flexible |
800 °C - 1100 °C
|
1x4" wafer or Copper/Nickel foil | ||||||||||||
|
Aixtron MOCVD - III-N system aix-ccs |
Clean (MOCVD) |
0.00 -
5.00 μm
|
400 °C - 1300 °C
|
4"x1, 2"X3, pieces | |||||||||||
|
Aixtron MOCVD - III-V system aix200 |
Pre-Diffusion Clean | Flexible |
0.00 -
5.00 μm
|
300 °C - 800 °C
|
4"x1 wafer or 2"x1 wafer or 4 pieces | ||||||||||
|
AJA Evaporator aja-evap |
Flexible |
0.00 -
300.00 nm
|
4"x3 or 6"x1 wafers or pieces | ||||||||||||
|
AJA2 Evaporator aja2-evap |
Flexible |
0.00 -
300.00 nm
|
4"x3 or 6"x1 wafers or pieces | ||||||||||||
|
Asylum AFM afm-asylum |
Flexible | ||||||||||||||
|
CHA Solutions II Evaporator cha-evap |
Flexible |
0.00 -
300.00 nm
|
4"x15 or 6"x3 wafers or pieces | ||||||||||||
|
Critical Point Dryer Tousimis Automegasamdri-936 cpd |
Flexible | ||||||||||||||
|
DISCO Wafer Saw DISCO wafersaw |
Flexible | 1x4", 1x6" or 1x8" wafer, or pieces | |||||||||||||
|
EVG 101 Spray Coater evgspraycoat |
"All" | 1 | |||||||||||||
|
Ex Fab Develop Wet Bench wbexfab_dev |
Flexible | ||||||||||||||
|
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | ||||||||||||||
|
Fiji 1 ALD fiji1 |
Semiclean |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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|
Fiji 2 ALD fiji2 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
||||||||||||
|
Fiji 3 ALD fiji3 |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 350 °C
|
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|
First Nano carbon nanotube CVD furnace cvd-nanotube |
Flexible |
800 °C - 1100 °C
|
1x4" wafer or multiple pieces | ||||||||||||
|
Headway 3 Manual Resist Spinner headway3 |
"All" | 1 piece or wafer | |||||||||||||
|
Headway Manual Resist Spinner headway2 |
"All" | one piece or wafer | |||||||||||||
|
Heidelberg MLA 150 heidelberg |
"All" |
|
405 nm | 1 | |||||||||||
|
Heidelberg MLA 150 - 2 heidelberg2 |
"All" |
|
375 nm | 1 |