Short Name:
2"
The following is a list of equipment where 2 inch round substrates are allowed.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID |
Training Required & Charges |
Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Lesker Sputter lesker-sputter |
Sputter Lesker 1&2 Training | Flexible | SNF Exfab Paul G Allen 155A Venice |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter |
|
SEM -Zeiss Merlin sem-merlin |
SEM-Merlin Training | "All" | SNF Exfab Paul G Allen 104 Stinson | |
|
Profilometer AlphaStep D-300 alphastep2 |
AlphaStep2 Training | Flexible | SNF Exfab Paul G Allen 104 Stinson | |
|
CHA Solutions II Evaporator cha-evap |
Evaporator CHA Training | Flexible | SNF Paul G Allen L107 Cleanroom |
For more than 300nm deposition, please contact Neel Mehta <nmehta26@stanford.edu> in advance |
|
Oxford Plasma Pro ICP-RIE Ox Ox-Ox |
Oxford Plasma Pro ICP-RIE Ox Training | Clean | SNF Paul G Allen L107 Cleanroom | |
|
Oxford Plasma Pro PECVD Ox-PECVD |
Oxford Plasma Pro PECVD Training | Semiclean, Flexible | SNF Paul G Allen L107 Cleanroom |