Skip to content Skip to navigation

Indium Nitride

Chemical Formula: 

Equipment Tabs

Deposition Equipment
Partial words okay.
Deposition Equipment
Equipment name & Badger ID Cleanliness Locationsort ascending Material Thickness Range Approved Materials supplied by Lab
Aixtron MOCVD - III-N system
SNF MOCVD Paul G Allen 213XA
0.00 - 5.00 μm
Subscribe to