The "Clean" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Clean" category.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
| Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Gasonics Aura Asher gasonics |
Resist Removal Dry Gasonics Training | Clean, Semiclean | SNF Paul G Allen L107 Cleanroom |
Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Wafers heated by lamps. |
|
AMAT Centurion Epitaxial System epi2 |
Epitaxial AMAT Centurion Training | Clean | SNF Paul G Allen L107 Cleanroom |
N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr |
|
RTA AllWin 610 aw610_l |
AllWin 610 RTA Training | Clean | SNF Paul G Allen L107 Cleanroom | |
|
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training | Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |
N and P doping available. For Si clean: SC1, SC2, HF dip. For Sapphire clean: SC1, SC2. For GaN template on Si or Sapphire: Piranha, SC1, SC2. |
|
Fiji 1 ALD fiji1 |
ALD Fiji 1 and 2 Training | Semiclean | SNF Paul G Allen L107 Cleanroom |