The "Clean" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Clean" category.
Stanford Nanofabrication Facility
Lab User Guide
Equipment Tables
Equipment name & NEMO ID |
Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Wet Bench Clean_res-hf wbclean_res-hf |
Wet Bench Clean Piranha/HF/Phosphoric Training | Clean | SNF Paul G Allen L107 Cleanroom |
Resist as mask allowed |
|
Wet Bench Clean_res-piranha wbclean_res-piranha |
Wet Bench Clean Piranha/HF/Phosphoric Training | Clean | SNF Paul G Allen L107 Cleanroom |
Resist will be removed |
|
Wet Bench CMOS Metal wbclean3 |
Wet Bench CMOS Metal (wbclean3) Training | Semiclean | SNF Paul G Allen L107 Cleanroom |
Al, Ti, or W wet etching or oxide etching |
|
Wet Bench Decontamination wbdecon |
Wet Bench Decontamination Training | Clean | SNF Paul G Allen L107 Cleanroom |
KOH or wafersaw or post-cmp decontamination |
|
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip | Clean (Ge), Semiclean, Flexible | SNF Paul G Allen L107 Cleanroom |
Wet Resist Removal: SRS-100 or PRS1000 |