Chemical Formula:
Cl2
| Equipment name & NEMO ID | Cleanliness |
Location |
Primary Materials Etched | Other Materials Etched | Gases |
|---|---|---|---|---|---|
|
Oxford Plasma Pro ICP-RIE ALE Ox-ALE |
SNF Paul G Allen L107 Cleanroom | ||||
|
Oxford III-V etcher Ox-35 |
SNF Paul G Allen L107 Cleanroom | ||||
|
Plasma Therm Versaline LL ICP Metal Etcher PT-MTL |
SNF Paul G Allen L107 Cleanroom | ||||
|
Lam Research TCP 9400 Poly Etcher lampoly |
SNF Paul G Allen L107 Cleanroom | ||||
|
Oxford Plasma Pro ICP-RIE Ox-gen |
SNF Paul G Allen L107 Cleanroom |
|
|
No equipment matches all of the filter criteria you have set above.