Deposition

Deposition covers a wide variety of methods that are used to add a wide variety of materials. The subcategories here can be useful to help narrow down your search.

• Atomic Layer Deposition (ALD) is used to deposit less than 50nm of highly conformal films.
• Chemical Vapor Deposition (CVD) is used to deposit films less than 5μm thick, carbon nanotubes, and graphene.
• Deposited III-N uses a type of CVD called MOCVD to deposit the nitrides of materials that are found in group III of the periodic table.
• Deposited III-V uses a type of CVD called MOCVD to deposit combinations of materials from group III and group V of the periodic table.
• Ink lists the equipment that can be used to print inks that are either commercially available or made by the user.
• Physical Vapor Deposition (PVD) is used to deposit primarily metal layers as well as some dielectrics.