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During integrated processing, cleaning steps are often inserted to remove un-needed resist, post-etch residues and particles, or to prepare a surface for a following process. The various tools listed here perform both dry and wet cleaning. The cleaning method you will need will depend on the materials you would like to remove as well as the contamination category of your sample. (For more about the contamination categories, please visit the Cleanliness (previously Contamination) Groups page).

Technique Tabs

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