Solvents are used to clean wafers that have materials exposed that are sensitive to the wet and dry resist strip techniques that use oxidation of the resist as the primary removal mechanism. Some common places where solvent cleans are used when there are exposed metals on the surface or when the substrate materials oxidize easily.
| Processing Techniques | Equipment name & NEMO ID | Teaser Blurb | Cleanliness |
Location |
|---|---|---|---|---|
| Solvent Cleaning, Metal Lift-off, Wet Chemical Processing |
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | SNF Exfab Paul G Allen 104 Stinson | |
| Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Manual solvent cleaning, two ultrasonic baths. |
Flexible | SNF Paul G Allen L107 Cleanroom |
| Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Manual solvent cleaning and resist removal, hot plate. |
Flexible | SNF Paul G Allen L107 Cleanroom |
| Solvent Cleaning, Wet Chemical Processing |
Wet Bench Solvent Lithography lithosolv |
Manual solvent cleaning of materials in the flexible cleanliness group. Teflon coated metal tweezers cleaning. SU8 development. |
Flexible | SNF Paul G Allen L107 Cleanroom |
| Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Wet Bench Flexible Solvents wbflexsolv |
Manual solvent cleaning of materials in the flexible cleanliness group. |
Flexible | SNF Paul G Allen L107 Cleanroom |