Wet Resist Removal, Wet Chemical Processing |
Wet Bench Resist Strip wbresstrip-1 |
Wet bench to remove resist using SRS-100 or PRS1000.
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Clean (Ge), Semiclean, Flexible |
SNF Cleanroom Paul G Allen L107 |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Manual solvent cleaning and resist removal, hot plate.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Manual solvent cleaning, two ultrasonic baths.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Wet Bench Flexible Solvents wbflexsolv |
Manual solvent cleaning of materials in the flexible cleanliness group.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing |
Wet Bench Flexcorr 1 wbflexcorr-1 |
Manual wet etching of non-standard materials using only SNF approved acids or bases. Hot plate available. GaAs allowed in personal labware only.
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Piranha Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Clean_res-piranha wbclean_res-piranha |
Wet Bench Clean_res-piranha is part of the 'clean' cleanliness group and is used to clean or remove resist from 3", 4", and 6" silicon, quartz, and silicon germanium wafers using piranha. 2 baths are available and can hold up to 25 wafers.
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Clean |
SNF Cleanroom Paul G Allen L107 |
Dry Resist Removal, Dry Etching |
Technics Asher technics |
Technics PE II-A is used for descum, resist strip and surface treatment with O2 plasma
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Plasma Mode Etching, Reactive Ion Etching (RIE), Downstream/Remote Plasma Resist Removal |
Samco PC300 Plasma Etch System samco |
The SAMCO etcher is a multifunctional etcher that can operate in either the RIE, plasma etch or Downstream plasma modes
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Matrix Plasma Resist Strip matrix |
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen).
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Flexible |
SNF Cleanroom Paul G Allen L107 |
Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Gasonics Aura Asher gasonics |
The Gasonics Aura Asher is an automated down stream microwave plasma system used for stripping photoresist of 4 inch wafers in the 'clean' cleanliness group.
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Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |