Wet Resist Removal, Wet Chemical Processing |
Wet Bench Resist Strip wbresstrip-1 |
Wet bench to remove resist using SRS-100 or PRS1000.
|
Clean (Ge), Semiclean, Flexible |
SNF Cleanroom Paul G Allen L107 |
Piranha Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Clean_res-piranha wbclean_res-piranha |
Wet Bench Clean_res-piranha is part of the 'clean' cleanliness group and is used to clean or remove resist from 3", 4", and 6" silicon, quartz, and silicon germanium wafers using piranha. 2 baths are available and can hold up to 25 wafers.
|
Clean |
SNF Cleanroom Paul G Allen L107 |
Decontamination, Metal Clean, Piranha Cleaning, Wet Resist Removal, Acid or Base Wet Etching, Aluminum and Titanium and Tungsten Wet Etching, Silicon Wet Etching, Silicon Oxide Wet Etching, Wet Chemical Processing |
Wet Bench Flexcorr 1 wbflexcorr-1 |
Manual wet etching of non-standard materials using only SNF approved acids or bases. Hot plate available. GaAs allowed in personal labware only.
|
Flexible |
SNF Cleanroom Paul G Allen L107 |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 1 wbflexsolv-1 |
Manual solvent cleaning, two ultrasonic baths.
|
Flexible |
SNF Cleanroom Paul G Allen L107 |
Solvent Cleaning, Wet Resist Removal, Wet Chemical Processing |
Wet Bench Flexible Solvents 2 wbflexsolv-2 |
Manual solvent cleaning and resist removal, hot plate.
|
Flexible |
SNF Cleanroom Paul G Allen L107 |
Solvent Cleaning, Wet Resist Removal, Metal Lift-off |
Wet Bench Flexible Solvents wbflexsolv |
Manual solvent cleaning of materials in the flexible cleanliness group.
|
Flexible |
SNF Cleanroom Paul G Allen L107 |