Pre-Diffusion cleans are used to prepare substrates for subsequent high temperature processing. Both the cleans bench and the subsequent high temperature processing steps have the strictest contamination requirements in the cleanroom. (For more about the contamination categories, please visit the Cleanliness (previously Contamination) Groups page).

The cleans generally consist of SC1 (short for Standard Clean 1) and SC2 (short for Standard Clean 2) and an optional HF (Hydrofluoric Acid) dip to remove organic particles and contaminants, metallic particles and contaminants, and native oxides respectively.  

Processing Technique Equipment name & NEMO ID Cleanliness Chemicals Substrate Size Maximum Load (number of wafers) Notes Stylus Tip Radius
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing Wet Bench Clean 1
wbclean-1 		Clean
25

No resist allowed. Resist should have been removed at the wbclean_res-piranha.
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing Wet Bench Clean 2
wbclean-2 		Clean
25

No resist allowed. Resist should have been removed at the wbclean_res-piranha