Processing Techniques Equipment name & NEMO IDsort descending Teaser Blurb Cleanliness Location
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing Wet Bench Clean 1
wbclean-1

Wet Bench Clean-1 and 2 is used for RCA cleaning 3", 4", and 6" silicon, silicon germanium, or quartz wafers which are in the 'clean' cleanliness group.

 Clean SNF Paul G Allen L107 Cleanroom
Pre-Diffusion Clean, Pre-LPCVD or Pre-Metal Clean, Wet Chemical Processing Wet Bench Clean 2
wbclean-2

Wet Bench Clean-1 and 2 is used for RCA cleaning 3", 4", and 6" silicon, silicon germanium, or quartz wafers which are in the 'clean' cleanliness group.

 Clean SNF Paul G Allen L107 Cleanroom