Characterization is a broad term that is used to describe any method of analysis of properties of materials and devices. The various tools listed here will use different techniques to study a wide variety of properties.

Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Locationsort ascending
Step Profile Dektak XT-S Stylus Profiler SNSF NPC

Surface profiler measures step heights as small as 10nm. Stylus tip radius is 12.5 microns.

SNSF NPC Spilker suite 6
Characterization SPF Measurement Bench
Characterization, Other Biologic SP-300
biologic

SP-300 is a 500 mA to 10 A research grade potentiostat/galvanostat/EIS with 7 mHz max frequency, floating mode, analog filtering, built-in calibration board, and stability bandwidths.

Flexible SNF Exfab Paul G Allen 155 Mavericks
Atomic Force Microscopy (AFM) Nanocue AFM
AFM NanoCue
Flexible SNF Exfab Paul G Allen 155 Mavericks
Dynamic Light Scattering Malvern Dynamic Light Scattering (DLS) Zetasizer
malvern-dls
Flexible SNF Exfab Paul G Allen 155 Mavericks
Characterization micromanipulator6000 IV-CV probe station
micromanipulator6000
"All" SNF Exfab Paul G Allen 151 Ocean
Sheet Resistance Measurement, Hall measurement Lakeshore Hall Measurement System
LakeshoreHall

Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current

"All" SNF Exfab Paul G Allen 151 Ocean
Atomic Force Microscopy (AFM) Asylum AFM
afm-asylum

Atomic force microscopy.

Flexible SNF Exfab Paul G Allen 151 Ocean
Characterization Jasco UV-Vis-NIR
jasco-uv-vis-nir
Flexible SNF Exfab Paul G Allen 151 Ocean
Characterization CytoViva HSI
cytoviva
Flexible SNF Exfab Paul G Allen 151 Ocean
Minority Carrier Characterization Sinton Lifetime Tester
sinton-lifetime-tester
Flexible SNF Exfab Paul G Allen 151 Ocean
Sheet Resistance Measurement LEI1500 Contactless Sheet Resistance Mapping
eddycurrent

Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current

"All" SNF Exfab Paul G Allen 151 Ocean
Ellipsometry Woollam
woollam
"All" SNF Paul G Allen L107 Cleanroom
Reflectometry Reflectance Spectrometer Filmetrics F40
filmetrics
"All" SNF Paul G Allen L107 Cleanroom
Optical Profilometer, Interferometry Sensofar S-neox
s-neox

3D optical profiler combining confocal, interferometry, and focus variation techniques to measure the surface height of smooth to very rough, ideally reflecting surfaces.

"All" SNF Paul G Allen L107 Cleanroom
Sheet Resistance Measurement Prometrix Resistivity Mapping System
prometrix

Contact sheet resistance mapping system for 2"up to 8" wafers.

"All" SNF Paul G Allen L107 Cleanroom
Film Stress Measurement Flexus 2320 Stress Tester
stresstest

Film stress and wafer curvature measurement.

"All" SNF Paul G Allen L107 Cleanroom
Reflectometry Nanospec 3
nanospec3
"All" SNF Paul G Allen L107 Cleanroom
Microscopy Keyence Digital Microscope VHX-6000
keyence

Microscopy

"All" SNF Exfab Paul G Allen 104 Stinson
Scanning Electron Microscopy (SEM) SEM -Zeiss Merlin
sem-merlin

Mid-Range SEM for inspection of wafer defects, etch depths, and lithography overlay.

"All" SNF Exfab Paul G Allen 104 Stinson

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