Characterization is a broad term that is used to describe any method of analysis of properties of materials and devices. The various tools listed here will use different techniques to study a wide variety of properties.
| Processing Techniques |
Equipment name & NEMO ID |
Teaser Blurb | Cleanliness | Location |
|---|---|---|---|---|
| Atomic Force Microscopy (AFM) |
Asylum AFM afm-asylum |
Atomic force microscopy. |
Flexible | SNF Exfab Paul G Allen 151 Ocean |
| Characterization, Other |
Biologic SP-300 biologic |
SP-300 is a 500 mA to 10 A research grade potentiostat/galvanostat/EIS with 7 mHz max frequency, floating mode, analog filtering, built-in calibration board, and stability bandwidths. |
Flexible | SNF Exfab Paul G Allen 155 Mavericks |
| Characterization |
CytoViva HSI cytoviva |
Flexible | SNF Exfab Paul G Allen 151 Ocean | |
| Step Profile | Dektak XT-S Stylus Profiler SNSF NPC |
Surface profiler measures step heights as small as 10nm. Stylus tip radius is 12.5 microns. |
SNSF NPC Spilker suite 6 | |
| Film Stress Measurement |
Flexus 2320 Stress Tester stresstest |
Film stress and wafer curvature measurement. |
"All" | SNF Paul G Allen L107 Cleanroom |
| Characterization |
Jasco UV-Vis-NIR jasco-uv-vis-nir |
Flexible | SNF Exfab Paul G Allen 151 Ocean | |
| Microscopy |
Keyence Digital Microscope VHX-6000 keyence |
Microscopy |
"All" | SNF Exfab Paul G Allen 104 Stinson |
| Sheet Resistance Measurement, Hall measurement |
Lakeshore Hall Measurement System LakeshoreHall |
Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current |
"All" | SNF Exfab Paul G Allen 151 Ocean |
| Sheet Resistance Measurement |
LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current |
"All" | SNF Exfab Paul G Allen 151 Ocean |
| Dynamic Light Scattering |
Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls |
Flexible | SNF Exfab Paul G Allen 155 Mavericks | |
| Characterization |
micromanipulator6000 IV-CV probe station micromanipulator6000 |
"All" | SNF Exfab Paul G Allen 151 Ocean | |
| Atomic Force Microscopy (AFM) |
Nanocue AFM AFM NanoCue |
Flexible | SNF Exfab Paul G Allen 155 Mavericks | |
| Reflectometry |
Nanospec 210XP nanospec2 |
Non-contact, spectro-reflectometry to measure the thickness of transparent films > 300 Ã (up to two) on substrates, such as silicon, that are reflective in the visible range. |
"All" | SNF Exfab Paul G Allen 104 Stinson |
| Reflectometry |
Nanospec 3 nanospec3 |
"All" | SNF Paul G Allen L107 Cleanroom | |
| Step Profile |
Profilometer Alphastep 500 alphastep |
Surface profiler measures step heights from 500 Å to 300 µm on materials in the flexible cleanliness group. Scan length from 100 Angstroms up to 0.3 mm. Stylus tip radius is 5 µm.
|
Flexible | SNF Exfab Paul G Allen 104 Stinson |
| Step Profile |
Profilometer AlphaStep D-300 alphastep2 |
A stylus-based (tip radius 2 microns) surface profiler that measures step heights from 50nm to 300 µm on materials.
|
Flexible | SNF Exfab Paul G Allen 104 Stinson |
| Sheet Resistance Measurement |
Prometrix Resistivity Mapping System prometrix |
Contact sheet resistance mapping system for 2"up to 8" wafers. |
"All" | SNF Paul G Allen L107 Cleanroom |
| Reflectometry |
Reflectance Spectrometer Filmetrics F40 filmetrics |
"All" | SNF Paul G Allen L107 Cleanroom | |
| Scanning Electron Microscopy (SEM) |
SEM -Zeiss Merlin sem-merlin |
Mid-Range SEM for inspection of wafer defects, etch depths, and lithography overlay. |
"All" | SNF Exfab Paul G Allen 104 Stinson |
| Optical Profilometer, Interferometry |
Sensofar S-neox s-neox |
3D optical profiler combining confocal, interferometry, and focus variation techniques to measure the surface height of smooth to very rough, ideally reflecting surfaces. |
"All" | SNF Paul G Allen L107 Cleanroom |