Characterization is a broad term that is used to describe any method of analysis of properties of materials and devices. The various tools listed here will use different techniques to study a wide variety of properties.

Processing Techniques Equipment name & NEMO ID Teaser Blurb Cleanliness Locationsort ascending
Step Profile Dektak XT-S Stylus Profiler SNSF NPC

Surface profiler measures step heights as small as 10nm. Stylus tip radius is 12.5 microns.

SNSF NPC Spilker suite 6
Characterization SPF Measurement Bench
Atomic Force Microscopy (AFM) Nanocue AFM
AFM NanoCue
Flexible SNF Exfab Paul G Allen 155 Mavericks
Dynamic Light Scattering Malvern Dynamic Light Scattering (DLS) Zetasizer
malvern-dls
Flexible SNF Exfab Paul G Allen 155 Mavericks
Characterization, Other Biologic SP-300
biologic

SP-300 is a 500 mA to 10 A research grade potentiostat/galvanostat/EIS with 7 mHz max frequency, floating mode, analog filtering, built-in calibration board, and stability bandwidths.

Flexible SNF Exfab Paul G Allen 155 Mavericks
Atomic Force Microscopy (AFM) Asylum AFM
afm-asylum

Atomic force microscopy.

Flexible SNF Exfab Paul G Allen 151 Ocean
Characterization Jasco UV-Vis-NIR
jasco-uv-vis-nir
Flexible SNF Exfab Paul G Allen 151 Ocean
Characterization CytoViva HSI
cytoviva
Flexible SNF Exfab Paul G Allen 151 Ocean
Minority Carrier Characterization Sinton Lifetime Tester
sinton-lifetime-tester
Flexible SNF Exfab Paul G Allen 151 Ocean
Sheet Resistance Measurement LEI1500 Contactless Sheet Resistance Mapping
eddycurrent

Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current

"All" SNF Exfab Paul G Allen 151 Ocean
Characterization micromanipulator6000 IV-CV probe station
micromanipulator6000
"All" SNF Exfab Paul G Allen 151 Ocean
Sheet Resistance Measurement, Hall measurement Lakeshore Hall Measurement System
LakeshoreHall

Contactless sheet resistance mapping system for up to 8" wafer, based on eddy current

"All" SNF Exfab Paul G Allen 151 Ocean
Optical Profilometer, Interferometry Sensofar S-neox
s-neox

3D optical profiler combining confocal, interferometry, and focus variation techniques to measure the surface height of smooth to very rough, ideally reflecting surfaces.

"All" SNF Paul G Allen L107 Cleanroom
Sheet Resistance Measurement Prometrix Resistivity Mapping System
prometrix

Contact sheet resistance mapping system for 2"up to 8" wafers.

"All" SNF Paul G Allen L107 Cleanroom
Film Stress Measurement Flexus 2320 Stress Tester
stresstest

Film stress and wafer curvature measurement.

"All" SNF Paul G Allen L107 Cleanroom
Reflectometry Nanospec 3
nanospec3
"All" SNF Paul G Allen L107 Cleanroom
Ellipsometry Woollam
woollam
"All" SNF Paul G Allen L107 Cleanroom
Reflectometry Reflectance Spectrometer Filmetrics F40
filmetrics
"All" SNF Paul G Allen L107 Cleanroom
Reflectometry Nanospec 210XP
nanospec2

Non-contact, spectro-reflectometry to measure the thickness of transparent films > 300 Å (up to two) on substrates, such as silicon, that are reflective in the visible range.

"All" SNF Exfab Paul G Allen L104 Stinson
Step Profile Profilometer AlphaStep D-300
alphastep2

A stylus-based (tip radius 2 microns) surface profiler that measures step heights from 50nm to 300 µm on materials.  

 

Flexible SNF Exfab Paul G Allen L104 Stinson

Pages