| Processing Technique | Equipment name & NEMO ID | Cleanliness | Material Thickness Range | Substrate Size | Maximum Load (number of wafers) | Notes | Stylus Tip Radius |
|---|---|---|---|---|---|---|---|
| Atomic Force Microscopy (AFM) |
Nanocue AFM AFM NanoCue |
Flexible | |||||
| Step Profile | testing Feb 5 2026 | ||||||
| Microscopy |
Keyence Digital Microscope VHX-6000 keyence |
"All" | |||||
| Atomic Force Microscopy (AFM) |
Asylum AFM afm-asylum |
Flexible | |||||
| Optical Profilometer, Interferometry |
Sensofar S-neox s-neox |
"All" | 1 |
non contact 3D optical profiling |
|||
| Step Profile |
Profilometer Alphastep 500 alphastep |
Flexible | 1 |
500Å to 300µm |
5 µm | ||
| Step Profile |
Profilometer AlphaStep D-300 alphastep2 |
Flexible | 1 | 2 µm | |||
| Step Profile | Dektak XT-S Stylus Profiler SNSF NPC | 1 | 12.5 µm | ||||
| Scanning Electron Microscopy (SEM) |
SEM -Zeiss Merlin sem-merlin |
"All" |
0.00 mm -
35.00 mm
|
one |
Stanford Nanofabrication Facility
Lab User Guide