Ellipsometry is a non-destructive, non-contact analysis method that can be used to characterize thickness (depth), crystalline nature, doping concentration, electrical conductivity, composition, and other material properties of thin films.
| Processing Technique | Equipment name & NEMO ID | Cleanliness | Substrate Size |
Maximum Load (number of wafers) |
Stylus Tip Radius |
|---|---|---|---|---|---|
| Ellipsometry |
Woollam woollam |
"All" | 1 |