Annealing and Oxidation are processing techniques that are performed at high temperatures. Annealing is used to change the properties of a materials that are present on your sample. Oxidation done in furnaces grows the highest quality SiO2 available in the SNF.
| Processing Techniques |
Equipment name & NEMO ID |
Teaser Blurb | Cleanliness | Location |
|---|---|---|---|---|
| Oxide Growth (furnace) |
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Clean | SNF Paul G Allen L107 Cleanroom | |
| Oxide Growth (furnace) |
Tystar Bank 2 Tube 6 B2T6 Clean Oxide |
Clean Tube Furnace for Wet and Dry Oxidation. |
Clean | SNF Paul G Allen L107 Cleanroom |
| Oxide Growth (furnace) |
Tystar Bank 2 Tube 5 B2T5 Clean Anneal |
Clean | SNF Paul G Allen L107 Cleanroom | |
| Oxide Growth (furnace), Annealing (furnace) |
Tystar Bank 1 Tube 2 B1T2 Flexible Oxide |
Flexible | SNF Paul G Allen L107 Cleanroom | |
| Oxide Growth (furnace) |
Tystar Bank 1 Tube 1 Anneal B1T1 Flexible Oxide |
Flexible | SNF Paul G Allen L107 Cleanroom | |
| Rapid Thermal Annealing |
RTA AllWin 610 aw610_r |
Flexible | SNF Paul G Allen L107 Cleanroom | |
| Rapid Thermal Annealing |
RTA AllWin 610 aw610_l |
Clean | SNF Paul G Allen L107 Cleanroom | |
| EPI (CVD), Low Pressure (LP) CVD, Hydrogen (H2) Annealing, Doping, Plasma Enhanced (PE) CVD |
AMAT Centurion Epitaxial System epi2 |
Deposit epitaxial and polycrystalline silicon, germanium and silicon-germanium films. |
Clean | SNF Paul G Allen L107 Cleanroom |