| Processing Technique | Equipment name & NEMO ID | Cleanliness | Chemicals | Substrate Size | Maximum Load (number of wafers) | Process Temperature Range | Developer | Notes | Stylus Tip Radius |
|---|---|---|---|---|---|---|---|---|---|
| Wafer Prime (HMDS) |
HMDS Vapor Prime Oven, YES2 yes2 |
"All" | 25 |
150 ºC
|
Singe and prime. No Resist allowed! |
||||
| Wafer Prime (HMDS), Singe |
HMDS Vapor Prime Oven, YES yes |
"All" |
150 ºC
|
Two programs: Singe and HMDS prime or Singe only. No Resist allowed! |
Stanford Nanofabrication Facility
Lab User Guide