Remote plasma etching or downstream plasma etching refers to the configuration wherein plasma is generated remotely relative to the process chamber and only the reactive species produced by the plasma reach the process chamber. This technique produces minimal surface damage at the substrate level and is used for plasma resist removal, surface cleaning and activation. In resist strip processes, the substrate is typically heated to enhance the reaction rate.
| Processing Techniques | Equipment name & NEMO ID | Teaser Blurb | Cleanliness | Location |
|---|---|---|---|---|
| Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Gasonics Aura Asher gasonics |
The Gasonics Aura Asher is an automated down stream microwave plasma system used for stripping photoresist of 4 inch wafers in the 'clean' cleanliness group. |
Clean, Semiclean | SNF Paul G Allen L107 Cleanroom |
| Downstream/Remote Plasma Resist Removal, Downstream/Remote Plasma Etching |
Matrix Plasma Resist Strip matrix |
The Matrix plasma asher is used to strip photoresist from contaminated wafers using a combination of oxygen plasma, high power, higher pressure and a heated chuck (platen). |
Flexible | SNF Paul G Allen L107 Cleanroom |