PMMA can be used as a negative photoresist.
Equipment name & Badger ID | Training Required & Charges | Cleanliness |
Location![]() |
Chemicals | Notes |
---|---|---|---|---|---|
Headway Manual Resist Spinner headway2 |
Resist Coat (manual) Headway Manual Training 1.00 hours |
SNF Cleanroom Paul G Allen L107 |
|
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists |
|
Laurell Manual Resist Spinner laurell-R |
Laurell Manual Resist Spinner Training 1.00 hours |
SNF Cleanroom Paul G Allen L107 |
SU-8, LOL, Ebeam resists allowed. No Acetone allowed. |