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Developers remove resist in UV-exposed areas (positive resists) or in UV-protected areas (negative resists) using an acid or base to dissolve the resist. The developer chemical required will depend on the specific resist used. 

List of Developers

Partial words okay.
Equipment name & Badger IDsort ascending Training Required & Charges Cleanliness Location Chemicals Notes
Wet Bench Miscellaneous
Wet Bench Miscellaneous Photoresist Training SNF Cleanroom Paul G Allen L107

Manual development of resist in beakers and Headway (manual resist spinner). SNF approved developers (acid or base). No solvents!

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