Skip to content Skip to navigation

Wet Resist Removal

Wet methods use either solvents or acids/bases to dissolve the resist in order to remove it from the substrate.

The wet bench you need will depend on the materials on your substrate as well as your substrate itself in addition cleanliness category of your sample. (For more about the cleanliness categories, please visit the Cleanliness (previously Contamination) Groups page).


Technique Tabs

Subscribe to