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Silicon Nitride

Chemical Formula: 

Deposited Silicon Nitride (commonally called "nitride') is used as an isulator in traditional semiconductors, a masking layer or a stuctural layer in some mechanical applications.
LPCVD: Thermco Nitride Deposition Furnace
Low stress Silicon nitride is deposited in the PlasmaTherm Shuttlelock PECVD System (ccp-dep) by the reaction between silane (5% Silane in He) and nitrogen. 
In the HDPCVD system, 100% silane and N2 are the reactants to produce silicon nitride film.
ALD: atomic layer deposition

Link to Silicon Nitride Wet Etching Technique

Equipment Tabs

Deposition Equipment
Partial words okay.
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