Wet Etch Process using Nitric Acid and H2O2
PROM Request Title:
Wet Etch Process using Nitric Acid and H2O2
PROM Request Summary:
Use existing chemicals for Nitric and H2O2 at SNF for non standard process.
PROM Date:
03/10/2017
PROM Decision:
Request approved.
Link to PROM Request and supporting documentation:
Equipment List:
