Mask Cleaning (manual)

Cleanliness of the photomask is important to the quality of the pattern transfer.

Technique Tabs

Main Tab

Processing Techniques	Equipment name & NEMO ID	Teaser Blurb	Cleanliness	Location
Mask Cleaning (manual), Wet Chemical Processing	Mask Scrubber masksrub	Manual mask cleaner for one 5 inch mask, water under pressure.	All	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & NEMO ID	Cleanliness	Chemicals	Mask Size	Notes
Mask Cleaning (manual), Wet Chemical Processing	Mask Scrubber masksrub	All	DI Water	5 inch	5 inch mask cleaning, water under pressure, no chemicals